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CSD13383F4 Series

12-V, N channel NexFET™ power MOSFET, single LGA 1 mm x 0.6mm, 44 mOhm, gate ESD protection

Manufacturer: Texas Instruments
Link to Manufacturer Page: https://www.ti.com/

Catalog

12-V, N channel NexFET™ power MOSFET, single LGA 1 mm x 0.6mm, 44 mOhm, gate ESD protection

PartTechnologyPackage / CaseSupplier Device PackageRds On (Max) @ Id, Vgs [Max]Drive Voltage (Max Rds On, Min Rds On)Power Dissipation (Max) [Max]Operating Temperature [Max]Operating Temperature [Min]Mounting TypeDrain to Source Voltage (Vdss)Input Capacitance (Ciss) (Max) @ Vds [Max]FET TypeCurrent - Continuous Drain (Id) @ 25°CGate Charge (Qg) (Max) @ VgsVgs(th) (Max) @ IdVgs (Max) [Max]Vgs (Max) [Min]
Texas Instruments
CSD13383F4
MOSFET (Metal Oxide)
3-XFDFN
3-PICOSTAR
44 mOhm
2.5 V, 4.5 V
500 mW
150 °C
-55 °C
Surface Mount
12 V
291 pF
N-Channel
2.9 A
2.6 nC
1.25 V
10 V
-10 V
Texas Instruments
CSD13383F4T
MOSFET (Metal Oxide)
3-XFDFN
3-PICOSTAR
44 mOhm
2.5 V, 4.5 V
500 mW
150 °C
-55 °C
Surface Mount
12 V
291 pF
N-Channel
2.9 A
2.6 nC
1.25 V
10 V
-10 V

Key Features

Low on-resistanceUltra low Qgand QgdUltra-small footprint (0402 case size)1.0 mm × 0.6 mmLow profile0.36 mm heightIntegrated ESD protection diodeRated >2 kV HBMRated >2 kV CDMLead and halogen freeRoHS compliantLow on-resistanceUltra low Qgand QgdUltra-small footprint (0402 case size)1.0 mm × 0.6 mmLow profile0.36 mm heightIntegrated ESD protection diodeRated >2 kV HBMRated >2 kV CDMLead and halogen freeRoHS compliant

Description

AI
This 37 mΩ, 12 V N-channel FemtoFET™ MOSFET technology is designed and optimized to minimize the footprint in many handheld and mobile applications. This technology is capable of replacing standard small signal MOSFETs while providing at least a 60% reduction in footprint size. . . . . This 37 mΩ, 12 V N-channel FemtoFET™ MOSFET technology is designed and optimized to minimize the footprint in many handheld and mobile applications. This technology is capable of replacing standard small signal MOSFETs while providing at least a 60% reduction in footprint size. . . . .